Free radical fast photo-cured gate dielectric for top-gate polymer field effect transistors

Abstract

We demonstrated top-gate organic field effect transistors (OFETs) made with free radical photo-cured polymer gate dielectrics and poly(3-hexylthiophene). We introduced a new approach of cross linking dielectric polymers in OFETs by using acrylate monomers cured with UV irradiation directly on the semiconductor. Three different blends were formulated: one self-initiating acrylate oligomer and two epoxy acrylate monomers mixed with 4-phenylbenzophenone as photo initiator and N-methyldiethanolamine as amine synergist. Thin films of these blends were cured in air within one minute. The curing process was monitored with FT-IR spectroscopy and the effect of a wetting agent was studied by measuring the CV characteristics of metal–insulator-semiconductor (MIS) structures made with these formulations. OFETs made with the demonstrated formulations showed high on/off ratios (105–106) and low sub-threshold slopes (0.44–1.42V/dec).