Year-end Sale % OFF 
Abstract
A growth model governed by the Poisson equation is presented to simulate the aggregation process in sputter (or vapor)-deposited thin films. By using computer simulation, it is found that the fractal dimension of the aggregates is consistent with that of diffusion-limited aggregation (DLA) at an initial stage and increases with time. The multifractal structure of the growth probability distribution is derived by making use of the Monte Carlo estimation. It is shown that the Poissonian growth pattern has characteristic fractal and multifractal properties.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
