Four-step fabrication of SERS-active microfluidic channels

E S Babich,A A Lipovskii,E S Gangrskaia,I V Reduto

doi:10.1088/1742-6596/1124/5/051020

Abstract

We present a technique to fabricate SERS substrates fully integrated with microfluidic channels. The fabrication of microsized dielectric channels was based on selective wet etching of a poled/unpoled silicate glass while silver nanoisland film was grown on the bottom of the channels via out-diffusion technique. Different combinations of fabrication steps were studied to optimize the channels’ depth, formation of the metal nanoislands and the roughness of the channels’ bottom.

Highlights

Glasses are widely used for the formation of devices for photonics and sensing, like phase diffraction gratings and microfluidic channels
thermal-electricfield imprinting (TEFI) is based on the modification of a glass at elevated temperature by shaped electric field (E-field) generated using a structured anodic electrode
The surface relief of the E-field modified glass, which results from the volume relaxation of the structurally/compositionally modified layer [3], presents height-scaled stamp of the anodic electrode

Summary

IOP Publishing

To cite this article: I Reduto et al 2018 J. Ser. 1124 051059 View the article online for updates and enhancements. I Reduto, D Raskhodchikov, E Gangrskaia, V Kaasik, Yu Svirko, A Lipovskii Institute of Photonics, University of Eastern Finland, Joensuu 80101, Finland 2 St. Petersburg Academic University RAS, St. Petersburg 194021, Russia 3 Peter the Great St. Petersburg Polytechnic University, St. Petersburg 195251, Russia

Introduction

Etched profile

Silicon etching rate

Findings

Conclusion