Abstract
Optical imaging and photolithography hold the promise of extensive applications in the branch of nano-electronics, metrology, and the intricate domain of single-molecule biology. Nonetheless, the phenomenon of light diffraction imposes a foundational constraint upon optical resolution, thus presenting a significant barrier to the downscaling aspirations of nanoscale fabrication. The strategic utilization of surface plasmons has emerged as an avenue to overcome this diffraction-limit problem, leveraging their inherent wavelengths. In this study, we designed a pioneering and two-staged resolution, by adeptly compressing optical energy at profound sub-wavelength dimensions, achieved through the combination of propagating surface plasmons (PSPs) and localized surface plasmons (LSPs). By synergistically combining this plasmonic lens with parallel patterning technology, this economic framework not only improves the throughput capabilities of prevalent photolithography but also serves as an innovative pathway towards the next generation of semiconductor fabrication.
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