Formation of two-dimensional periodic nanostructures on fused quartz, polyimide, and polycrystalline diamond by pulsed four-wave interference laser modification

Abstract

Atomic force microscopy is used to examine the topography of submicron periodic structures formed on the surfaces of synthetic polycrystalline diamond and polyimide films. The films are deposited on fused quartz substrates by four-wave interference modification using a pulsed 308-nm UV XeCl excimer laser. It is demonstrated that a two-dimensional periodic relief with a submicron period can be formed on the diamond surface directly by laser evaporation in the absence of a photoresist. Depending on the exposure, two mechanisms of polyimide film modification are observed. At exposures less than 100 mJ/cm2, the relief is formed due to swelling at the positions of interference maxima. At exposures greater than 100 mJ/cm2, holes are formed in the films. A periodic relief on the fused quartz surface is formed by using a UV photoresist exposed to pulsed interference laser radiation and subsequent Ar ion etching.