Abstract
Formation of nanoparticles in a 50-nm-thick SiO 2 film on Si was conducted by silver negative ion implantation at 30 keV with various doses, and the state of nanoparticles in the thin oxide film was observed by a cross-sectional scanning TEM. The sample implanted with 1 × 10 15 ions/cm 2 showed nanoparticles with diameter of about 2–3 nm distributed in the middle of the SiO 2 film on Si. The location of nanoparticles was in good agreement with the calculated profile by TRIM-DYN. Nanoparticles with various diameters of 4–8 nm formed in samples of 1 × 10 16 and 1 × 10 17 ions/cm 2. The size of silver nanoparticles was found to relate strongly to density of implanted atoms in the layer.
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