Abstract
The dual ion implantation of silicon and carbon into copper (99.9%), iron (99.9%), SKD11 steel and SUS304 austenitic stainless steels were carried out by the MeV energy ion accelerator. The cross sectional images of implanted layer were observed by scanning electron microscopy (SEM) with energy dispersive X-ray spectroscopy (EDS). The microstructure of surface layer was analyzed using X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). It was shown that silicon carbide were formed by the dual ion implantation into metals. The hardness of sample was measured by the Nano-Indenter. Consequently, it was understood that the hardness of implanted substrate was improved by dual ion implantation.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.