Abstract
Here we study the pattern formation on tantalum foils after low-energy ion irradiation with 3 keV Ar ion beams. Surfaces display a variety of patterns decorated with nanodots. The associated surface roughness demonstrates an initial increase but a subsequent decrease as a function of ion fluence. The decrease in roughness, after critical fluence, is related to the development of several linear modulations on the surface which subsequently transform to ripples. The growth and roughness parameters of the ion-sputtered surfaces indicate scaling behaviors.
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