Abstract
AbstractThis paper reports a new proposal on patterned electrode formation of Ionic Polymer‐Metal Composite (IPMC) using a photolithography technique with a dry film resist (DFR). By using a photomask with a pattern size of 50 µm, patterned electrodes are formed on a polyelectrolyte membrane, resulting in a size of 60 µm. The sheet resistance of the fabricated electrodes is lower than 30 Ω/□, which is almost in the same order of magnitude as that of electrodes formed by the conventional electroless plating without photolithography. © 2008 Institute of Electrical Engineers of Japan. Published by John Wiley & Sons, Inc.
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