Abstract
The formation of palladium silicide thin films from Pd/Si(110) and Pd/Si(001) systems with and without a Ti intermediate layer has been investigated. The existence of a Ti layer could improve the thermal stability of Pd2Si thin layers in Pd/Ti/Si(001). In addition, an epitaxial or highly oriented Pd2Si layer is formed in Pd/Ti/Si systems. However, the roughness of the Pd2Si/Si interface is observed in Pd/Ti/Si(110) systems, while the flatnesses of the Pd2Si/Si interface is observed in Pd/Ti/Si(001).
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
