Formation of negative ions by electron impact on SiF4 and CF4

Abstract

First measurements of cross sections for the formation of negative ions by electron attachment to SiF4 and CF4 are reported for an electron impact energy range of 0 to 50 eV. The energies at which the various ions appear and the positions at which the ionization efficiency curves peak have been obtained and compared with previous measurements. Thermochemical data have been used to predict and identify the various channels of dissociation. Cross sections for the production of ion pairs through the process of polar dissociation have also been measured.