Abstract
In this Work, Mg2si/MgO Nano-Composites Were Prepared by Co-Sputtering of Mg and Si Targets on Si {100} Substrates Using Dual Cathode Magnetron Sputtering. Films Were, Subsequently, Annealed at 380°C and 500°C for 4 Hours in Ar Gas Atmosphere. Various Mg/Si Sputtering Power Ratios Have Been Examined. Grown Films Were Characterized by XRD, SEM/EDS, and IR Reflectivity Measurements.
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