Abstract
AbstractFormation of metal nano‐islands on heat‐treated substrates by either conventional deposition or by electron beam–induced chemical vapour deposition (EBI‐CVD) was performed at elevated temperatures in an ultrahigh vacuum transmission electron microscope (UHV‐TEM). Pd islands on SrTiO3 (001) substrates, Pd silicide islands on Si (111) substrates, and Fe silicide islands on Si (111) substrates showed bimodal island growth; both substrates blocked islands and nano‐wires. The morphologies of these islands are suggested to be sensitive to the substrate conditions because of heat treatment before deposition. Selective growth of the nano‐wires was successful in the case of EBI‐CVD. Copyright © 2006 John Wiley & Sons, Ltd.
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