Abstract
Polycrystalline GaAs was obtained by heat-treatment of sequentially electrodeposited As and Ga layers. The single layers were electrodeposited galvanostatically from alkaline Ga and acidic As solutions. The structural, morphological and compositional evolution of two-layers brought about by heat-treatment at various temperatures as a function of time was studied by SEM-EDX, laser profilometry and X-ray diffractometry. The formation of GaAs occurs by reaction-diffusion. The value of the Ga diffusion coefficient was determined in the temperature range 80–190°C and correspondingly resulted to vary from 1.4×10−21 to 4.8×10−18m2s−1. Furthermore the activation energy (100kJmol−1) and the frequency factor (9.1×10−7m2s−1) of the process were evaluated. The results are discussed in terms of structural and morphological factors and related to the results on the Ga-Sb, In-As and In-Sb systems previously studied in our group.
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