Formation of etch pits during carbon doping of gallium arsenide with carbon tetrachloride by metalorganic vapor-phase epitaxy

Abstract

Scanning tunneling microscopy was used to examine the effects of carbon tetrachloride concentration and temperature on the morphology of carbon-doped gallium arsenide films grown by metalorganic vapor-phase epitaxy. Deposition was carried out at 505–545 °C, a V/III ratio of 75, and IV/III ratios between 0.5 and 5.0. The growth rate declined monotonically with increasing carbon tetrachloride concentration. Step bunching and pinning was observed at a IV/III ratio of approximately 2.5. Increasing this ratio further resulted in the formation of pits ranging from 20 to 50 nm in diameter. These results can be explained by two competing processes that occur at the step edges: (1) the reaction of chlorine with adsorbed gallium from the group III precursor, and (2) the reaction of chlorine with gallium arsenide. Both reactions desorb gallium chlorides and reduce the growth rate, but only the latter reaction produces pits.