Abstract
An atomistic lattice-gas model is developed which successfully describes all key features ofthe complex mounded morphologies which develop during deposition of Ag films onAg(111) surfaces. We focus on this homoepitaxial thin film growth process below200 K. The unstable multilayer growth mode derives from the presence of a largeEhrlich–Schwoebel step-edge barrier, for which we characterize both the step-orientationdependence and the magnitude. Step-dynamics modeling is applied to further characterizeand elucidate the evolution of the vertical profiles of these wedding-cake-like mounds.Suitable coarse-graining of these step-dynamics equations leads to instructive continuumformulations for mound evolution.
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