Abstract
The influence of water vapor on the formation of carbonaceous deposits formed in the course of CH 4-H 2O reaction on metallic Ni was studied at 1000 K. It was found that a very low concentration of water vapor ( x H 2 O = 0.05) increased the quantity of carbon deposits on the metallic Ni-surface. Only with higher contents of water in the reaction gas mixture an inhibitory effect of this component was established. The reaction rate of C-formation varied with contact time showed a minimum. The reaction mechanism of C-deposition on metallic Ni-surface in the course of CH 4-H 2O reaction is proposed.
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