Formation of Au-Ag alloy nanoparticles in amorphous silicon using sequential ion implantation

Abstract

Au-Ag alloy nanoparticles were formed into amorphous silicon by sequential ion implantation of Au and Ag. Monocrystalline Si was amorphized at the initial moment of implantation with 1 × 1016 ions/cm2 gold ions, and then different silver fluences were applied in the range of 1 × 1016–1 × 1017 ions/cm2. After implantations the samples were investigated by means of Rutherford backscattering spectrometry and transmission electron microscopy. The nanoparticles were found to be formed at surface and sub-surface regions of the Si substrate, at depths corresponding to the maximum distribution of Au and Ag ions. The particles are crystalline in nature with sizes from 2 nm to 30 nm in diameter, increasing with silver ion fluence. Although the lattice constants of gold and silver are too close to be distinguished by measuring the characteristic interplanar spacings, imaging in scanning transmission mode confirms the formation of Au-Ag bimetallic nanoparticles, presenting a solid-solution alloy of gold and silver.