Abstract
Stainless steel films doped with various amounts of nitrogen were deposited on (1 0 0) silicon wafers by radio frequency magnetron sputtering of an austenitic stainless steel target in argon and nitrogen gas mixtures, containing a range of nitrogen compositions. The evolution of phases as a function of nitrogen doping was studied by X-ray diffraction and transmission electron microscopy. It was found that with increasing nitrogen composition in the gas mixture, the crystalline structure of the films changed from bcc ferrite ( α), to expanded fcc austenite ( γ N) supersaturated with nitrogen, and finally to the MN type nitride (Fe 0.69Cr 0.2Ni 0.1Mo 0.01)N phase with ideal cubic symmetry and further enlarged lattice. This MN type phase has a fcc structure with a lattice parameter about 0.433 nm and possibly possesses the zinc blende type lattice structure. The morphological features of the single MN phase films produced are also discussed in this paper.
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