Abstract
Amorphous nanoclusters of chromium and titanium silicides have been synthesized by implanting 35 keV chromium and 30 keV titanium ions, at a fluence of 1×1017 cm−2 in amorphous silica. The cluster stoichiometries were [Cr]/[Si]=1.6±0.3 and [Ti]/[Si]=1.1±0.3, respectively, as obtained by energy dispersive spectroscopic x-ray microanalysis and confirmed by x-ray photoelectron spectroscopy analysis. Titanium-implanted ions are more reactive than chromium ones in terms of the formation of chemical bonds with silicon of the host silica matrix.
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