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Abstract
The interaction of beryllium and tungsten is investigated by deposition of thin beryllium layers (several nanometers) from the vapor phase onto polycrystalline tungsten substrates and analysis by means of X-ray photoelectron spectroscopy (XPS). Already after room temperature deposition we observe formation of a surface alloy, limited to the interface between the layer and the substrate. The alloy intensity increases continuously between 670K and 1070K. The alloy formation is restricted to a depth of 1.2nm in maximum. Be in excess to this layer thickness desorbs from the sample surface. No Be diffusion or dissolution in the W bulk is observed. Sputter depth profiles before and after annealing experiments in combination with TRIDYN calculations demonstrate that Be is limited to the near-surface area of the tungsten substrate.
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