Abstract
The results of studying the X-ray photoelectron spectroscopy of the chemical composition of nickel surface layers with a deposited aluminum film, depending on the dose of irradiation with argon ions, are presented. Analysis of the spectra shows the formation of Ni3Al aluminide during ion-beam mixing. The highest content (~20%) of this compound in the modified layer is observed at an implantation dose of 5 × 1016 cm–2.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
