Abstract
Placement of quantum dots (QDs) and insight into QD's basic internal structure and optical properties lay nature cornerstones for advanced photonic devices. We report a manageable growth method for placing dense three-dimensional Ge QD arrays in a uniform or a grading size distribution, using thermal oxidation of poly-SiGe in layer-cake techniques. The QD size and spatial density in each stack could be well modulated by Ge content in poly-Si <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1−x</inf> Ge <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">x</inf> , oxidation and underlay buffer layer conditions. Size-dependent internal structure, strain, and photoluminesce properties of Ge QDs are systematically investigated. Optimization of processing conditions was carried out for producing dense Ge QD arrays for maximizing photovoltaic efficiency.
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