Abstract
Abstract{100} Facet‐terminated nanocrystalline and {100} textured large‐grained polycrystalline diamond (PCD) have been grown simultaneously not only on different substrates but also on the same substrate from a single deposition run using high‐power microwave plasma chemical vapor deposition (MPCVD). The synthesis of diamond with varying morphologies in the same deposition run was achieved by combining the effect of nitrogen addition on diamond growth and the influence of substrate size and geometry on the distribution of the plasma power density and temperature along the substrate. We have modeled the temperature distribution on the substrates by computer simulations using the finite element method. The formation mechanism of several morphologies including both {100} facet‐terminated nanocrystalline and {100} textured large‐grained PCD on one substrate is discussed based on this temperature analysis and other simulation results described in the literature.
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