Abstract
Carbon nitride thin films have been prepared by the reactive ionized cluster beam (RICB) method using mixed beam of activated carbon and nitrogen atoms and atom clusters produced from polyethylene and NH 3. The structure of the films has been characterized by electron diffraction analysis that shows strong evidences suggesting the formation of crystalline β-C 3N 4 phase embedded in the amorphous film matrix. Rutherford backscattering measurements show that average nitrogen content is up to 40%. X-ray photoelectron spectroscopy indicates that carbon and nitrogen form a weak polarized covalent bond in these C-N thin films.
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