Abstract
The main features of the formation of (V, Ti)-N-He thin films deposited under bombardment by mixed beams of high-energy N and He ions are studied. Their structural, phase, electrophysical, and adsorption characteristics are studied. The electron microscopy data proved that the structure of (V, Ti)-N-He compounds forms under the conditions of competition of several simultaneously occurring processes leading to the formation of a nanocrystalline structure that contains micropores with dimensions of 5 nm to 5 μm. The role of ion bombardment and gas adsorption from the residual atmosphere in forming porosity is discussed. The comparison of the Rutherford backscattering and profilometry data makes it possible to determine the value of the film porosity (27%). In the pressure range under study (up to 0.35 MPa), 600 cm3/g or more (7 wt %) of hydrogen was adsorbed. It is shown that pores accumulate the main portion of hydrogen; in this case, the amount of hydrogen depends not on the material composition, but on the microporous film structure and the composition of the gas medium in pores.
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