Abstract
AbstractIn this study, thin films of CuInSe2 (CIS) are expeditiously fabricated within 1 s utilizing the pulsed laser welding (PLW) technique. Preceding the PLW process, thin films of InSe (500 nm) are coated with Cu nanosheets of 60 and 120 nm thicknesses using vacuum coating systems. The optimal PLW parameters leading to the formation of CIS films include a pulse width of 1.0 ms, a spot diameter of 2.0 mm, and a repetition frequency of 10 Hz. The resulting CIS films exhibited a well‐crystalline cubic structure with lattice parameters of 5.265 Å. Surface morphology analyses revealed the preferential formation of porous films with varying stoichiometry, a characteristic that can be manipulated by adjusting laser welding parameters. The energy band gap and room temperature electrical conductivity display values of 1.80 eV and 2.06 × 10−5 (Ωcm)−1, respectively. Cu‐rich samples exhibit a wider energy band gap of 1.94 eV and lower electrical conductivity values of 4.78 × 10−7 (Ωcm)−1. The CIS film demonstrates n‐type conductivity attributed to the formation of donor levels centered at 0.24 and 0.10 eV. This study presents an ultrafast method for fabricating CIS films with physical properties compatible with those produced using traditional methods.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.