Abstract

The polymerization of organic vapours has been studied in a radio frequency plasma (14 MHz) whose electron density has been measured by a resonant cavity method. Changes in the electron density were brought about by modification of the energy input. At constant pressure the rate of deposition has been found to be proportional to the electron density. This is true at different pressures and with such different monomers as styrene and methane. The deposition rate was modified by the introduction of a background gas into the organic plasma, and this was attributed to changes in electron density and temperature. As an illustration, at the same total pressure, monomer partial pressure and electron density, the deposition rate was greater with hydrogen than with nitrogen as a background gas, corresponding to the well-known higher electron temperature in a hydrogen plasma.

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