Formation and Optical Characteristics of GaN:Eu/GaN Nanowires for Applications in Light-Emitting Diodes

Abstract

This paper reviews our recent research about the formation and optical characteristics of GaN:Eu/GaN nanowires (NWs) by metalorganic vapor phase epitaxy for application in GaN-based red light-emitting diodes (LEDs). Two types of GaN:Eu/GaN NWs with different configurations are introduced, core–shell and axial geometries. The configuration of GaN:Eu layers on GaN core NWs can be controlled by changing the growth conditions, and affects the properties of Eu luminescence in the GaN NWs. Next, the optimization of the p-GaN growth conditions is performed to allow to form the p-GaN shell layers on the NWs with the pedestal of the NWs free from radial overgrowth, resulting in efficient electrical isolation between top and bottom part of the NWs. Then, the fabrication process of the NW LEDs towards future possible realization of flexible devices is established, including an etch-back process of the PDMS membranes to expose the top p-GaN contact layers. Finally, a proto-type of p-GaN/GaN:Eu/n-GaN NW LEDs on sapphire substrates is fabricated to characterize the device properties. Sharp red luminescence at room temperature from Eu3+ ions is observed under current injection. These results would pave the way towards the realization of flexible light-emitting devices utilizing NW structures based on compound semiconductors.