Abstract
Monocrystalline silicon substrates have been implanted with 70 keV N + and C + ions. During implantation, thin layers of carbon films, containing about 10% of silicon, have been deposited by controlled vacuum carburization. RBS and AES techniques were used for surface analyses. Friction studies were carried out by a ball on disc tribometer. Drastic reduction of the friction coefficient was observed for the surface treated samples. It was found that the vacuum carburized layer acts as a solid lubricant. Diamond scratch tests also showed a reduced tendency for crack formation on the implanted/vacuum carburized surfaces.
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