Abstract
A focused ion beam line of MeV heavy ions has been developed by combining a focusing system consisting of objective slits and a magnetic quadrupole doublet to the beam line of a tandem-type accelerator. The demagnification factors of this system were determined to be 1/3.4 for the horizontal direction and 1/14 for the vertical direction, and a minimum beam spot size of 5.6 µm×8.0 µm was achieved. This system allows us ion beam processes such as maskless MeV ion implantation and ion beam microanalysis using heavy ions.
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