Abstract
SynopsisTo study the potential role of low energy secondary electrons in focused electron beam induced deposition (FEBID) we have studied FEBID using 1,1-dichloro-1-silacyclohexane, silacyclohexane and 1,3,5-trisilacyclohexane. While the first of these compounds shows appreciable cross sections for dissociative electron attachment (DEA) in the gas phase, DEA is not observed for the latter two. Dissociative ionization, on the other hand is a fairly efficient decomposition path for all three compounds. The performance of these compounds in FEBID is compared with their decomposition through low energy electrons in the gas phase and discussed in context to the role of DEA and DI in FEBID.
Highlights
For comparison we grew series of pillars using DCSCH and TSCH with increasing electron beam exposure time
Synopsis To study the potential role of low energy secondary electrons in focused electron beam induced deposition (FEBID) we have studied FEBID using 1,1-dichloro-1-silacyclohexane, silacyclohexane and 1,3,5-trisilacyclohexane
Dissociative ionization, on the other hand is a fairly efficient decomposition path for all three compounds. The performance of these compounds in FEBID is compared with their decomposition through low energy electrons in the gas phase and discussed in context to the role of dissociative electron attachment (DEA) and DI in FEBID
Summary
For comparison we grew series of pillars using DCSCH and TSCH with increasing electron beam exposure time.
Sign-in/Register to view highlights & summary Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
