Abstract
An approach to the microscale patterning of metal surfaces called "focused electric field-induced ion transport" (FEFIIT) is introduced. This process is a modification of the noncontact through-mask electrochemical etching method, in which an ion-selective membrane separates the anodic and cathodic electrolyte volumes. The membrane allows for a low metal ion concentration near the anode. The electric field near the workpiece can be modified by means of a perforated insulated mask parallel to the membrane surface. The performance of the FEFIIT process is studied both experimentally and computationally. Recommendations for process improvement are provided.
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