Abstract
Abstract Using a simulation, we investigate the effects of the light source size and derive an effective method for suppression of the subfringes that appear in ArF Talbot lithography, which has been proposed for submicron pattern transfer applications. The appearance of the subfringes, which were caused by interference, was related to the size of the light source. If an appropriate light source size is chosen, then, a large process window can be obtained. Guidelines for source size selection are given.
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