Abstract
Ferromagnetic resonance (FMR), X-ray reflection diffraction (XRD) and cross-sectional high-resolution transmission electron microscopy (XHRTEM) are applied to characterize the stresses of the d.c. biased plasma-sputter-deposited Ni 97Cu 3 films grown epitaxially on a MgO(001) substrate. The FMR study indicates that a homogeneously compressive intrinsic stress and an anisotropic planar stress are simultaneously induced in the film. The latter consists of the part induced during the film formation and the part originated from the magnetocrystalline anisotropy of the Ni–Cu crystal. The compressive stress in the film is also confirmed by the XRD study. The XHRTEM study reveals misfit dislocations generated in the Ni–Cu crystal at the MgO interface relaxing the strain energy due to the lattice mismatch between Ni 97Cu 3 and MgO crystals and locally induced lattice distortions. In conclusion the stress inside the film is compressive as a whole. © 1997 Elsevier Science S.A.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
