Abstract
Recent experiments on systems such as Rh Ag or Ni Ag have shown that, in an intermediate range of temperature, competition between the flux of the deposited adatoms and the interdiffusion between the deposit and the substrate can lead to an original growth mode in which a floating mono- or bi-substrate layer buries the deposited film. This surfactant effect has been previously modelled, in the simplified situation of successive flashes of a complete monolayer, in the framework of the kinetic tight-binding Ising model. We show here that the extension of this model to the case of a continuous incoming flux leads to a wide variety of behaviours concerning the depth and spatial extension of the buried film as a function of the flux.
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