Abstract
A photolithographic patterning technique of perfluoropolymers was developed for the micropatterning of solution-processed organic semiconductors. We found that a small amount of fluorosurfactant additives in photoresist solutions enabled preparation of the spin-coated films even on the dewetting surfaces of perfluoropolymers. Subsequent photolithography and dry/wet etching achieved excellent patterning of perfluoropolymers, which provided a high contrast of wettability in microscale on the substrate. The dewetting patterns were applied for isolating solution-processed organic thin-film transistor arrays for a 100 ppi active-matrix display by selective dewetting. The isolation of the semiconducting layers achieved significant improvement in the current on/off ratio with a high mobility of >1 cm2 V−1 s−1.
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