Abstract
The reaction between silicic acid and the fluoride ion in aqueous solution has been investigated at 25°C in a 3 m (Li)ClO4 medium, by potentiometric methods employing a fluoride ion-selective electrode to observe the free hydrogen fluoride concentration. The acidity varied between 0.3 and 3 m, while the concentration of silicic acid was maintained below 2.5 x 10−3 m which is thought to be the saturation level of amorphous silica. The experimental data have been explained in terms of Si(OH)3F, SiF4, SiF62−, HSiF6− and a minor species to which the composition Si(OH)2F+ has been tentatively assigned.
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