Abstract
AbstractHigh‐purity octafluoropropane (C3F8) electronic specialty gas is a key chemical raw material in semiconductor and integrated circuit manufacturing industry, while selective removal of hexafluoropropylene (C3F6) impurity for C3F8 purification is essential but a challenging task. Here we report a fluorinated cage‐like MOF Zn‐bzc‐CF3 (bzc=5‐(trifluoromethyl)‐1H‐pyrazole‐4‐carboxylic acid) for C3F6/C3F8 separation. The incorporation of −CF3 groups not only provides suitable pore aperture size for highly efficient size‐exclusive C3F6/C3F8 separation, but also creates hydrophobic microenvironments, endowing Zn‐bz‐CF3 high chemical stability. Remarkably, Zn‐bzc‐CF3 exhibits high C3F6 adsorption capacity while excluding C3F8, achieving ideal molecular‐sieving C3F6/C3F8 separation. Breakthrough experiments show that Zn‐bzc‐CF3 can efficiently separate C3F6/C3F8 mixture and high‐purity C3F8 (99.9 %) can be obtained.
Published Version
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