Abstract
High-purity octafluoropropane (C3F8) electronic specialty gas is a key chemical raw material in semiconductor and integrated circuit manufacturing industry, while selective removal of hexafluoropropylene (C3F6) impurity for C3F8 purification is essential but a challenging task. Here we report a fluorinated cage-like MOF Zn-bzc-CF3 (bzc=5-(trifluoromethyl)-1H-pyrazole-4-carboxylic acid) for C3F6/C3F8 separation. The incorporation of -CF3 groups not only provides suitable pore aperture size for highly efficient size-exclusive C3F6/C3F8 separation, but also creates hydrophobic microenvironments, endowing Zn-bz-CF3 high chemical stability. Remarkably, Zn-bzc-CF3 exhibits high C3F6 adsorption capacity while excluding C3F8, achieving ideal molecular-sieving C3F6/C3F8 separation. Breakthrough experiments show that Zn-bzc-CF3 can efficiently separate C3F6/C3F8 mixture and high-purity C3F8 (99.9 %) can be obtained.
Published Version
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