Abstract
This experiment is a continuation of the study concerned with the lift-off based patterning of nanocrystaline quantum dot (NQD) films. The NQD films patterned by lift-off process are analyzed by means of fluorescence microscopy to obtain information about film uniformity, pattern definition accuracy, and average fluorescence intensity. The lift-off process is implemented using wet (acetone immersion) and dry (oxygen plasma) photoresist removing ambient. Methods under investigation were found to perform similarly in terms of pattern resolution accuracy. However, in terms of the uniformity of fluorescence intensity distribution, acetone dissolution of photoresist was found to produce better results.
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