Fluid Simulation over a Rotating Disk: Momentum and Mass Transfer across the Wafer Boundary

Abstract

This research focuses on the crucial task of identifying the viscous sublayer in improving wet cleaning processes. Computational fluid dynamics (CFD) is employed to manipulate fluid properties and process parameters for optimizing cleaning efficiency. The research findings encompass the evolution of thickness across the wafer radius, characterization of the wavy air-liquid interface, velocity profile within the liquid, and measurement of the viscous sublayer's thickness. Key findings highlight the significance of small-scale turbulent structures, the competition between Coriolis and viscous forces, and the successful utilization of CFD LES (Large Eddy Simulation) for quantifying and visualizing the viscous sublayer and eddy flow.