Abstract
Nanocrystalline thin films of NiO were prepared by advanced reactive gas deposition, and their responses to formaldehyde, ethanol and methane gases were studied via fluctuation-enhanced and conductometric methods Thin films with thicknesses in the 200–1700-nm range were investigated in as-deposited form and after annealing at 400 and 500°C. Morphological and structural analyses showed porous deposits with NiO nanocrystals having face-centered cubic structure. Quantitative changes in frequency-dependent resistance fluctuations as well as in DC resistance were recorded upon exposure to formaldehyde, ethanol and methane at 200°C. The response to formaldehyde was higher than that to ethanol while the response to methane was low, which indicates that the NiO films exhibit significant selectivity towards different gaseous species. These results can be reconciled with the fact that formaldehyde has a nucleophilic group, ethanol is an electron scavenger, and methane is hard to either reduce or oxidize. The gas-induced variations in DC resistance and resistance fluctuations were in most cases similar and consistent.
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