Flexible mask illumination setup for serial multipatterning in Talbot lithography

Abstract

A flexible illumination system for Talbot lithography is presented, in which the Talbot mask is illuminated by discrete but variable incidence angles. Changing the illumination angle stepwise in combination with different exposure doses for different angles offers the possibility to generate periodic continuous surface relief structures. To demonstrate the capability of this approach, two exemplary micro-optical structures were manufactured. The first example is a blazed grating with a stepsize of 1.5 μm. The second element is a specific beam splitter with parabolic-shaped grating grooves. The quality of the manufacturing process is evaluated on the basis of the optical performance of the resulting micro-optical elements.