Abstract
A CO(2) laser system with flexible parameters was developed for fundamental research related to an extreme ultraviolet (EUV) lithography source. The laser is a master oscillator and power amplifier (MOPA) system, consisting of a master oscillator, an externally triggered plasma switch, a preamplifier, a main amplifier, and electronic synchronization units. The laser pulse duration can be varied easily from 10 to 110 ns, with a constant peak power for pulse durations from 25 to 110 ns. The MOPA laser system can also be operated in dual-oscillator mode to produce laser pulse with pulse duration as long as 200 ns and a train of laser pulses with flexible interval. The divergence of the laser beam is 1.3 times the diffraction limit. The laser intensity on the target surface can be up to 8x10(10) W/cm(2). Utilizing this CO(2) MOPA laser system, high conversion efficiency from laser to in-band (2% bandwidth) 13.5 nm EUV emission has been demonstrated over a wide range of laser pulse durations.
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