Abstract
In nanotechnology it is required to get information about thin layers and their chemical composition by very small lateral resolution. Thin film means a microscopically thin layer of material that is deposited onto a metal, ceramic or semiconductor substrate. Thin films having a thickness of less than 1 micron can be conductive or dielectric (non-conductive). Thin films can be used, for example, as top metal layer on a chip and multiple coating on magnetic disks. By means of FESSEM especially thin layers and structures in nanoscale can be observed and the elemental composition or thickness of each layers determined. It is quite difficult to realize small dimensions (e.g. 5-100 nm) and low thicknesses (1-100 nm) with a chemical composition that is mainly based on light elements. The experiments should show whether the EDS/ThinFimID method is suited for element identification and failure analysis.
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