Finite element analysis of the initial stages of the laser ablation process

Abstract

The growth of thin films by pulsed-laser deposition involves extremely complex physical processes. The study of different aspects of the basic mechanisms of the laser ablation is still in progress, with special emphasis on the modelling of the plume deflection effect and the structure formation on the irradiated surface. In this work, the initial stages of the laser ablation process have been investigated considering the surface roughness and the continuous morphological changes of the surface produced by laser irradiation. Assuming a thermal ablation model, a computational approach of the structure formation on the irradiated surface by finite elements using ansys ® (6.1) has been developed. Complementary, different ablation experiments on silicon wafers using a XeCl excimer laser (308 nm) impinging at 45° with respect to the target were carried out. Scanning electron microscope analyses were performed to study the morphological changes of the Si surface. The validity of the model and the agreement of the numerical results are discussed.