Abstract
We fabricated single-walled carbon nanotube (SWCNT) thin-films via the combination of inkjet printing and site-selective deposition based on the patterning of self-assembled monolayers (SAMs) through an optical lithography mask. Previously, we patterned SWCNT films by ultraviolet light irradiation onto SAMs through metal masks, and the minimum film size achieved was 90 µm wide. In this study, we succeeded in achieving a width of 13 µm using SAMs and optical lithography masks, thus improving the performance limit of SWCNT printed electronics.
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