Abstract
Abstract We report on the use of low power (~2 W) continuous wave Ar+ laser for etching (engraving) of diamond films via a laserinduced local oxidation (burning) reaction. Smooth fine-grained diamond films of about 10 μm thickness have been grown on Mo and Si substrates in a d.c. arc discharge using CH 4 H 2 gas mixtures. The sharply focused laser beam was scanned under computer control over the film surface causing fast diamond oxidation in air or pure O2 atmosphere. The dependence of etch rate on laser power, beam scanning velocity and film quality was examined. Various grooves and holes of a few micrometres in size have been produced with etch rate of tens of micrometres per second.
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