Abstract
Nano structures on organic solar material are expected to improve power generation efficiency instead of bulk hetero junctions. In this study, we fabricated high aspect ratio nano structures using poly-3-hexylthiophene (P3HT) by a novel nano-imprint process. Fine structures 70-nm wide and 550-nm high were successful obtained. However, the pattern defects in the de-molding process were increased by basing on the increment of the pattern′s aspect ratio. We also investigated the relation between aspect ratio and defect yield.
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